![Chromium Sputter Target [Cr] Thickness:1/8](https://cdn.shopify.com/s/files/1/0117/2714/2969/products/Cr_Target.jpg?v=1539227815)
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Ultimate Pressure (Total):
Plasma is used to increase the surface energy of many materials with high efficiency
For effective treatment
The heart of this portable plasma device is the TDK piezo plasma generator CeraPlas™ – a high-voltage discharge device for generating cold atmospheric-pressure plasma
Warranty options 2 year parts
Chromium Sputter Target [Cr] Thickness:1/8" Ultimate Pressure (Total):Chromium [Cr] Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Various diameters, thicknesses and purities available to suit all major sputter source manufacturers. If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation. All our materials are tested using ICP OES chemical analysis and manufactured under ISO9001: 2008 certification. Materials are vacuum packed under cleanroom
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