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K18 Leave-In Molecular Repair Hair Mask Hydrating Skincare Contains Centella asiatica extract

SKU: 95673804811

4.8
USD275.00 USD312.00

Pay in 4 interest-free payments of $68.75 Learn more

Shipping Estimate
USA
  • USA
  • CAN

Ships within 48 hours · Estimated delivery Aug 26 - Aug 31

Description

Contains Centella asiatica extract

it is free from added fragrance and formulated with minimal ingredients

invisible finish

and hyaluronic acid to restore healthy-looking hair

reducing shine and preventing clogged pores

K18 Leave-In Molecular Repair Hair Mask Hydrating Skincare Contains Centella asiatica extractThe K18 Leave In Molecular Repair Hair Mask is a groundbreaking treatment that works at the molecular level to repair hair damage caused by bleach, color treatments, chemical services, and heat styling. Powered by the patented K18PEPTIDE, this leave in mask penetrates deep into the hairs cortex to reconnect broken polypeptide chains and disulfide bonds, effectively restoring hairs core strength and resilience. Clinically proven to deliver immediate

Exchange/Return Notes
  • We offer a 30-day return/exchange service after receiving.
  • Final sale items are not eligible for returns or exchanges.
  • To process your return/exchange, please contact us at [email protected]
  • Please click here for more details>>> Return & Exchange Policy

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